Silicon oxide emulsion refers to the even distribution of silicon dioxide particles within a medium. This fundamental concept plays a crucial role in various industrial applications. The properties of silicon nanoparticles influence the resulting dispersion characteristics, including particle size, shape, and surface chemistry. Understanding these

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Sputtering is a prominent technique utilized in the fabrication of advanced thin films. Titanium (Ti) sputtering, in particular, has emerged as a leading method due to its ability to deposit high-quality Ti thin films with accurate thickness and composition. The process involves bombarding a Ti target with energetic ions, liberating atoms that then